Guido Beuckert und Brandenburg - Info zur Person

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Mitarbeiter - Fachgebiet Angewandte Physik und ...Brandenburgische Technische Universität Cottbus-Senftenberg

www.b-tu.de

Guido Beuckert, Techniker, 5353, LG1A, R Dr.-Ing. Karsten Henkel, Ingenieur, 5354, LG1A, R M. Sc. Ioanna Paloumpa, Ingenieurin, 5353, LG1A, ...

In situ studies of the atomic layer deposition of thin HfO2 dielectrics ...ur.art1lib.com › book

ur.art1lib.com

Thin Solid Films 518 (2010) 4688– Acknowledgements The authors acknowledge the experimental assistance of Guido Beuckert (Brandenburg University of ...

Atomic layer deposition reactor for fabrication of metal oxidesWiley

onlinelibrary.wiley.com

von K Kolanek · · Zitiert von: 6 — assistance of Guido Beuckert (Brandenburg University of Technology). This work was supported by Bundesministerium für Bildung und Forschung ( ...

Atomic layer deposition of HfO2 investigated in situ by ...pwr.edu.pl

materialsscience.pwr.edu.pl

von K KOLANEK · · Zitiert von: 2 — The authors acknowledge the assistance with experiments provided by Guido Beuckert and Konstan- tin Karavaev (Brandenburg University of Technology).

Height distribution of atomic force microscopy images as a ...DOI

doi.org

— The authors acknowledge the experimental assistance of Guido Beuckert and Konstantin Karavaev (Brandenburg University of Technology).

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