Guido Beuckert und Brandenburg University - Info zur Person

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In situ studies of the atomic layer deposition of thin HfO2 dielectrics ...ur.art1lib.com › book

ur.art1lib.com

Thin Solid Films 518 (2010) 4688– Acknowledgements The authors acknowledge the experimental assistance of Guido Beuckert (Brandenburg University of ...

Atomic layer deposition reactor for fabrication of metal oxidesWiley

onlinelibrary.wiley.com

von K Kolanek · · Zitiert von: 6 — assistance of Guido Beuckert (Brandenburg University of Technology). This work was supported by Bundesministerium für Bildung und Forschung ( ...

Atomic layer deposition of HfO2 investigated in situ by ...pwr.edu.pl

materialsscience.pwr.edu.pl

von K KOLANEK · · Zitiert von: 2 — The authors acknowledge the assistance with experiments provided by Guido Beuckert and Konstan- tin Karavaev (Brandenburg University of Technology).

Height distribution of atomic force microscopy images as a ...DOI

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— The authors acknowledge the experimental assistance of Guido Beuckert and Konstantin Karavaev (Brandenburg University of Technology).

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Guido Beuckert und Brandenburg University Person-Info

In situ studies of the atomic layer deposition of thin HfO2 dielectrics ...ur.art1lib.com › book

Atomic layer deposition reactor for fabrication of metal oxidesWiley

Atomic layer deposition of HfO2 investigated in situ by ...pwr.edu.pl

Height distribution of atomic force microscopy images as a ...DOI

Alle Infos zum Namen "Guido Beuckert"