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SameName_Update1/RH.csv at master · DionyBudy/SameName_Update1 ·...
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Interessen
Globalfoundries Inc patent inventors (2012)
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Hans-juergen Thees · Hans-jürgen Engelmann · Harry J. Levinson · Hartmut Ruelke · Heike Scholtz · Heinz-juergen Voss · Hemant Adhikari · Hirohisa Kawasaki.
CHRISTOF STRECK - Patents
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Inventors: Ulrich Mayer, Hartmut Ruelke, Christof Streck Increasing reliability of copper-based metallization structures in a ...
Business-Profile
patentbuddy: Hartmut Ruelke
GLOBALFOUNDRIES INC., Dresden, DE
Ausbildung
Effect of Arginine on the Aggregation of Protein in Freeze ...Scholars Portal Journals
journals.scholarsportal.info
Related Articles: ; T.P. Ferguson · Jianmin Qu · March 2006, ; Christoph Kubasch · Christoph Klaus · Hartmut Ruelke · Ulrich Mayer · Johann W Bartha · August 2010, ... Related Articles: ; T.P. Ferguson · Jianmin Qu · March 2006, ; Christoph Kubasch · Christoph Klaus · Hartmut Ruelke · Ulrich Mayer · Johann W Bartha · August 2010, ...
Effect of HPMC and Carbopol on the release and floating ...Scholars Portal
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Hartmut Ruelke · Ulrich Mayer · Johann W Bartha. Source Information. August 2010, Volume57(Issue8)Pages, p.1865To IEEE Transactions on Electron Devices ... Hartmut Ruelke · Ulrich Mayer · Johann W Bartha. Source Information. August 2010, Volume57(Issue8)Pages, p.1865To IEEE Transactions on Electron Devices ...
Pumping effect to accelerate liquid uptake in concrete and its ...Scholars Portal Journals
journals.scholarsportal.info
... of Moisture Uptake in Low- κ Dielectric Materials. Authors. Christoph Kubasch · Christoph Klaus · Hartmut Ruelke · Ulrich Mayer · Johann W Bartha ...
Bücher
Official Gazette of the United States Patent and Trademark ...google.de
books.google.de
... Hartmut Ruelke ; Joerg Hohage , both of Dresden , Germany , and Lothar Mergili , Radebeul , Germany , assignors to Advanced Micro Devices , Inc. , Sunnyvale ...
USPTO Image File Wrapper Petition Decisions 0146google.de
books.google.de
... Hartmut Ruelke , et al . Application No ,910 Filed : June 16 , Commissioner for PaTENTS UNITED STATES Patent and Trademark Office P.O. BOX ...
Official Gazette of the United States Patent and Trademark Office:...
books.google.lv
US 6,372,668 B2 METHOD OF FORMING SILICON OXYNITRIDE FILMS Sey-Ping Sun; Homi Nariman, both of Austin, Tex., and Hartmut Ruelke, Dresden, ...
USPTO Image File Wrapper Petition Decisions Google Books
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I45D www.uspto.gov WILLIAMS, MORGAN & AMERSON, P.C, RICHMOND, SUITE HOUSTON TX In re Application of Hartmut Ruelke, ...
Dokumente zum Namen
semiconductor manufacturing handbookMcGraw-Hill Education - Access Engineering
www.accessengineeringlibrary.com
D. President, CTO. Micell Technologies. Raleigh, NC. Hartmut Ruelke. AMD Fellow. Advanced Micro Devices. Dresden, Germany. BOARD OF REVIEWERS. Larry Shive, Ph.D ... D. President, CTO. Micell Technologies. Raleigh, NC. Hartmut Ruelke. AMD Fellow. Advanced Micro Devices. Dresden, Germany. BOARD OF REVIEWERS. Larry Shive, Ph.D ...
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— Hartmut Ruelke, Dresden Wilschdorf. (DE); Lothar Mergili, Radebeul (DE);. 6,153,523 A : Van Ngo et al Joerg — Hartmut Ruelke, Dresden Wilschdorf. (DE); Lothar Mergili, Radebeul (DE);. 6,153,523 A : Van Ngo et al Joerg ...
Globalfoundires | Thin Films - Academia.edu
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Wissenschaftliche Veröffentlichungen
Water uptake of a low-κ dielectric filmScienceDirect.com
www.sciencedirect.com
von C Kubasch · · Zitiert von: 4 — The authors like to acknowledge the work of Andreas Jahn and Heidrun Hiemann from the IHM, TU Dresden, Dresden, Germany and Hartmut Ruelke and Ulrich Mayer ... von C Kubasch · · Zitiert von: 4 — The authors like to acknowledge the work of Andreas Jahn and Heidrun Hiemann from the IHM, TU Dresden, Dresden, Germany and Hartmut Ruelke and Ulrich Mayer ...
Veröffentlichungen allgemein
A two-step UV curing process for producing high tensile ...Springer
link.springer.com
von T Fischer · · Zitiert von: 2 — Joerg Hohage, Hartmut Ruelke & Ralf Richter. Fraunhofer ENAS, Technologie Campus 3Chemnitz, Germany. Stefan E. Schulz & T. Gessner. von T Fischer · · Zitiert von: 2 — Joerg Hohage, Hartmut Ruelke & Ralf Richter. Fraunhofer ENAS, Technologie Campus 3Chemnitz, Germany. Stefan E. Schulz & T. Gessner.
Sonstiges
Semiconductor structure having a silicon oxynitride ARC ...Google Patents
patents.google.com
Hartmut Ruelke: Martin Mazur: Minh Ngo; Current Assignee. The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no ... Hartmut Ruelke: Martin Mazur: Minh Ngo; Current Assignee. The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no ...
Amit MaratheVeriPages
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Hartmut Ruelke - Wilschdorf, DE. Assignee: Advanced Micro Devices, Inc. - Sunnyvale CA. International Classification: H01L US Classification: Hartmut Ruelke - Wilschdorf, DE. Assignee: Advanced Micro Devices, Inc. - Sunnyvale CA. International Classification: H01L US Classification:
Christof Streck's research works | GlobalFoundries Inc., ...ResearchGate
www.researchgate.net
Ulrich Mayer · Hartmut Ruelke · Christof Streck. A silicon-based low-k dielectric material is formed on the basis of a single ... Ulrich Mayer · Hartmut Ruelke · Christof Streck. A silicon-based low-k dielectric material is formed on the basis of a single ...
Dual stress liner for high performance sub-45nm gate ...Semantic Scholar
www.semanticscholar.org
... Hartmut Ruelke and J. Klais and Peter Huebler and Scott Luning and Ralf van Bentum and Gunter Grasshoff and Christoph Schwan and Edward E. Ehrichs and Scott Hartmut Ruelke and J. Klais and Peter Huebler and Scott Luning and Ralf van Bentum and Gunter Grasshoff and Christoph Schwan and Edward E. Ehrichs and Scott ...
Implementation of CVD low-k dielectrics for high-volume ...Gale
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von H Ruelke · · Zitiert von: 18 — Gale Academic OneFile includes Implementation of CVD low-k dielectrics for high-volume by Hartmut Ruelke, Peter Huebler, Christof. Click to explore. von H Ruelke · · Zitiert von: 18 — Gale Academic OneFile includes Implementation of CVD low-k dielectrics for high-volume by Hartmut Ruelke, Peter Huebler, Christof. Click to explore.
Investigation of Moisture Uptake in Low-$\kappa$ ...Semantic Scholar
www.semanticscholar.org
... Hartmut Ruelke and Ulrich Mayer and Johann W. Bartha}, journal={IEEE Transactions on Electron Devices}, year={2010}, volume={57}, pages={ }, url Hartmut Ruelke and Ulrich Mayer and Johann W. Bartha}, journal={IEEE Transactions on Electron Devices}, year={2010}, volume={57}, pages={ }, url ...
Ultra-low-k porous SiCOH dielectric degradation process ...Academia.edu
www.academia.edu
by Hartmut Ruelke , th IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits. See Full PDF Download PDF. Free ... by Hartmut Ruelke , th IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits. See Full PDF Download PDF. Free ...
[특허]Method and apparatus for depositing an etch stop layer사이언스온
scienceon.kisti.re.kr
Sey-Ping Sun ; Homi Nariman ; Hartmut Ruelke DE, Method of forming silicon oxynitride films. 상세보기. Chen, David; Goto, Haruhiro Harry; Martina, Martina ... Sey-Ping Sun ; Homi Nariman ; Hartmut Ruelke DE, Method of forming silicon oxynitride films. 상세보기. Chen, David; Goto, Haruhiro Harry; Martina, Martina ...
Enhanced adhesion of PECVD carbon on dielectric ...USPTO .report
uspto.report
— This patent grant is currently assigned to GLOBALFOUNDRIES Inc.. The grantee listed for this patent is Volker Jaschke, Hartmut Ruelke. Invention — This patent grant is currently assigned to GLOBALFOUNDRIES Inc.. The grantee listed for this patent is Volker Jaschke, Hartmut Ruelke. Invention ...
Eine kupfer-verbindungsstruktur mit verbesserter zwischenfläche ...Google Patents
patents.google.com
Other languages: German: English; Inventor: Minh Van Ngo: Hartmut Ruelke: Lothar Mergili: Joerg Hohage: Lu You: Robert A Huertas: Richard Huang ...
US A - Teos plasma protection technologyGoogle
www.google.com.na
US A1 * Hartmut Ruelke Method of forming a teos cap layer at low temperature and reduced deposition rate.
Hartmut Ruelke's research works | GlobalFoundries Inc., ...ResearchGate
www.researchgate.net
Hartmut Ruelke's 31 research works with 448 citations and reads, including: Investigation of Argon Plasma Damage on Ultra Low-kappa Dielectrics (vol 4, ...
A two-step UV curing process for producing high tensile stressed...
www.cambridge.org
A two-step UV curing process for producing high tensile stressed silicon nitride layers - Volume 1455
Bibliographies: 'Low-[kappa] dielectric'Grafiati
www.grafiati.com
Kubasch, Christoph, Christoph Klaus, Hartmut Ruelke, Ulrich Mayer, and Johann W. Bartha. "Investigation of Moisture Uptake in Low-$\kappa$ Dielectric ...
(PDF) Investigation of Argon Plasma Damage on Ultra Low- Dielectrics...
www.academia.edu
Investigation of Argon Plasma Damage on Ultra Low- Dielectrics
Cu capping layer deposition with improved integrated circuit ...Московский инновационный кластер
i.moscow
Автор(ы): Minh Van Ngo Hartmut Ruelke Lothar Mergili Joerg Hohage Lu You Robert A. Huertas Richard J. Huang NGO MINH VAN RUELKE HARTMUT MERGILI LOTHAR ...
Method of improving adhesion of capping layers to copper ...Московский инновационный кластер
i.moscow
Advanced Micro Devices, Inc. ADVANCED MICRO DEVICES INC ADVANCED MICRO DEVICES, INC. Автор(ы): Minh Van Ngo Hartmut Ruelke Lothar Mergili Joerg Hohage Lu You ...
Study of Electromigration in Integrated Circuits at Design ...repositorio.unicamp.
repositorio.unicamp.br
von RO Nunes — [97] Minh Van Ngo, Hartmut Ruelke, Joerg Hohage, and Lothar Mergili. Method of forming capped copper interconnects with reduced hillocks, April
Symposium Session | MRS Fall Meeting | BostonMaterials Research Society
www.mrs.org
Hartmut Ruelke 1 , Volker Jaschke 1 , Kai Frohberg 1 , Mihaela Balseanu 2 , Tsutomu Kiyohara 2 , Li-Qun Xia 2 , Derek Witty 2 , Hichem M'Saad
MRS Online Proceedings Library (OPL): Volume | Cambridge Core
www.cambridge.org
Tobias Fischer, Lutz Prager, Joerg Hohage, Hartmut Ruelke, Stefan E. Schulz, Ralf Richter, T. Gessner; Published online by Cambridge University Press: 31 July ...
Verwandte Suchanfragen zu Hartmut Ruelke
| Ralf Richter Christoph Klaus Peter Huebler | Lothar Mergili Volker Jaschke Christoph Kubasch | Joerg Hohage |
Personen Vorname "Hartmut" (14564) Name "Ruelke" (15) |
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