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News
GADEST 2009
www.ihp-microelectronics.com
XIII International Autumn Meeting - Gettering and Defect Engineering in Semiconductor Technology - GADEST September October 02,
Netzwerk-Profile
J. Hoentschel | Semantic Scholar
www.semanticscholar.org
Semantic Scholar profile for J. Hoentschel, with 19 highly influential citations and 121 scientific research papers.
Bücher
[IEEE IEEE International Reliability Physics Symposium ...
zh.booksc.eu
Compensation of Operation-Related FMAX Degradation by Adaptive Control of Circuit Operating Voltage M. A. Wiatr, R. Heller*, J. Hoentschel, R. Geilenkeuser, ... › book
Analog IC Reliability in Nanometer CMOS - Elie Maricau, Georges...
books.google.de
This book focuses on modeling, simulation and analysis of analog circuit aging. First, all important nanometer CMOS physical effects resulting in circuit...
High Mobility Materials for CMOS Applications - Google Books
books.google.cz
M. Wiatr, A. Mowry, A. Gehring, R. Boschke, C. Scott, J. Hoentschel, S. Duenkel ...
Recent Topics on Modeling of Semiconductor Processes, Devices, and...
books.google.cz
The last couple of years have been very busy for the semiconductor industry and researchers. The rapid speed of production channel length reduction has brought...
Dokumente zum Namen
Proceedings Template - WORD
venividiwiki.ee.virginia.edu
von H Wang — [4] M. Reiche, O. Moutanabbir, J. Hoentschel , U. Gösele, S. Flachowsky and M. Horstmann, Strained Silicon Devices', Solid State Phenomena Vols. › images › Vlsi_f...
Untitled - Morawa
www.morawa-buch.at
T. Herrmann, W. Klix, R. Stenzel, S. Duenkel, R. Illgen, J. Hoentschel,. T. Feudel, M. Horstmann. Line Edge and Gate Interface Roughness Simulations of ...
Veröffentlichungen allgemein
Publication
www-old.mpi-halle.mpg.de
Reiche, M. , O. Moutanabbir , J. Hoentschel , U. Gösele , S. Flachowsky , and M. Horstmann Strained silicon devices. Strained silicon channels are one of the ...
Artikel & Meinungen
AMD & GlobalFoundries to talk about 28-nm FD-SOI
www.techpowerup.com
— M. Horstmann, J. Hoentschel, J. Schaeffer; GLOBALFOUNDRIES (invited). Click to expand. › a...
Will HKMG make AMD superior? | Tom's Hardware Forum
forums.tomshardware.com
Page 2 - Seeking answers? Join the Tom's Hardware community: where nearly two million members share solutions and discuss the latest tech.
Sonstiges
: मुफ़्त में डाउनलोड. ई-बुक पुस्तकालय. Z-Library में ऑन लाइन पुस्तकों...
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: मुफ़्त में डाउनलोड. ई-बुक पुस्तकालय. Z-Library में ऑन लाइन पुस्तकों की दुकान | BookSC. Download books for free. Find books
Advanced SOI CMOS transistor technologies for high-performance...
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The blue social bookmark and publication sharing system.
ULIS CONFERENCE PROGRAM - PDF Free Download
docplayer.net
J. Hoentschel, Global Foundries 11:15 11:35 Impact of local back biasing on ...
EuroSOI – SOI Industry Consortium
soiconsortium.eu
The tutorials included “SOI technologies and circuits,” presented by J. Hoentschel of GlobalFoundries, and “SOI substrate for RF?” by Eric ...
Design Technology Co-Optimization in advanced FDSOI CMOS around the...
hal-cea.archives-ouvertes.fr
... Energy Point: body biasing and within-cell VT-mixing. F. Andrieu 1, * L. Pirro 2 R. Berthelon 1, 3 J. Morgan 2 G. Cibrario 1 M. Wiatr 2J. Hoentschel 2 M. Vinet 1
[PDF] Implementation and Optimization of Asymmetric Transistors in...
www.semanticscholar.org
Sub-40nm Lgate asymmetric halo and source/drain extension transistors have been integrated into leading-edge 65 nm and 45 nm PD-SOI CMOS technologies. With...
Pushpa Publishing House
www.pphmj.com
Moutanabbir, J. Hoentschel, U. Gsele, S. Flachowsky and M. Horstmann, Strained silicon devices, Solid State Phenomena (2010), [13] B. R › article
In-line Si1-xGex epitaxial process monitoring and diagnostics using...
cyberleninka.org
3 M. Reiche, O. Moutanabbir, J. Hoentschel, U. Gosele, S. Flachowsky, and M. Horstmann, Solid State Phenomena , 61 (2010). 4 M. V. Fischetti, Z. Ren, ...
Novel approaches to improve laser annealed SOI-MOSFETs
www.infona.pl
J. Hoentschel. AMD Saxony LLC & Co. KG, Wilschdorfer , D Dresden, Germany. see all. Keywords. SOI-MOSFETs Laser anneal Rapid ...
Publications | Nano and Quantum Semiconductors Laboratory
www.polymtl.ca
[42] A. Hähnel, M. Reiche, O. Moutanabbir, H. Blimtritt, H. Geisler, J. Hoentschel, and H.-J. Engelmann Improving Accuracy and Precision of Strain Analysis by ...
Abstract: (Invited) VLSI-CMOS Device Technology Scaling Landscape...
ecs.confex.com
— J. Hoentschel (Globalfoundries LLC), R. Carter (GLOBALFOUNDRIES), and B. Rice (Globalfoundries LLC). Smart and innovative products are using ... › Paper97856
Breakthroughs at the IEDM – SOI Industry Consortium
soiconsortium.org
— Implementation and Optimization of Asymmetric Transistors in Advanced SOI CMOS Technologies for High Performance Microprocessors. J. Hoentschel, ... › breakth...
Stepper streamlines pHEMT production for 5G markets - News
compoundsemiconductor.net
Our selection of industry specific magazines cover a large range of topics.
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