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Diffusion Phenomena in the Chemically Amplified CARL Resist System -...

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Dr. Jorg Daub for his guidance on this thesis. Special thanks got to my supervisors Dr. Stefan Hien and Dr. Michael Sebald at Infineon Technologies Bodo Krieger, Andrea Maier, Dr. Jorg Rottstegge, and Kerstin Seibold have contributed ...

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Method for forming a lithography pattern - Taiwan Semiconductor...

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A method of lithography patterning includes forming a first material layer on a substrate, the first material layer being substantially free of silicon, and...

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Photosensitive polymer including copolymer of alkyl vinyl ...

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US A1 (en) *, Jorg Rottstegge, Resist for photolithography having reactive groups for subsequent modification of the ... › patents

US A - Photostructuring process - Google Patentspatents.google.com › patent

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US A1 * Jorg Rottstegge Photoresists with reaction anchos for chemical consolidation of resist structures for exposures at ...

US B2 - Photoresists with reaction anchors for chemical ...patents.google.com › patent

patents.google.com

US A1 * Jorg Rottstegge Amplification of resist structures of fluorinated resist polymers by structural growth of the ...

Jorg Rottstegge - Entity | RPX Insightinsight.rpxcorp.com › entity › jorg-rottste...

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Jorg Rottstegge has 0 patent litigation cases (0 cases currently active) - 0 patents asserted - 0 cases as a plaintiff - 0 cases as a defendant.

Method and material for forming a double exposure lithography ...

pubchem.ncbi.nlm.nih.gov

Jorg Rottstegge et al., Ultra thin film imaging at 157 nm, Infineon Technologies AG, Polymer Materials and Technology, Erlangen Germany, 9 pages. (APP,APP). › ...

US B2 - Resist for electron beam lithography and a process ...google.com › patents

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US A1 * Jorg Rottstegge Process for increasing the etch resistance and for reducing the hole and trench width of a ...

US A - Photoresist compositions comprising polycyclic ...

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US A1 (en) *, Jorg Rottstegge, Negative resist process with simultaneous development and aromatization of resist ... › patents

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