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EU H2020 Project "SENATE (Seven Nanometer Technology)"www.fabiodisconzi.com › open-h2020 › projects
www.fabiodisconzi.com
2017, Vicky Philipsen, Kim Vu Luong, Laurent Souriau, Eric Hendrickx, Andreas Erdmann, Dongbo Xu, Peter Evanschitzky, Robbert W. E. van de Kruijs, ...
Growth of Ultrathin Films of Amorphous Ruthenium−Phosphorus ...pubs.acs.org › doi › abs
pubs.acs.org
· ... Christophe Detavernier, Vicky Philipsen, Vu Luong, Karl Opsomer, Andreas Erdmann, Peter Evanschitzky, Frank Scholze, Christian Laubis, ...
Application of the hybrid Hopkins–Abbe method in full-chip OPCwww.sciencedirect.com › science › article › abs › pii
www.sciencedirect.com
Andreas Erdmann, Giuseppe Citarella, Peter Evanschitzky, Hans Schermer, Vicky Philipsen, Peter De Bisschop, Validity of... Mazen Saied et al., ...
Journal of Micro/Nanolithography MEMS and MOEMS - ScienceGatewww.sciencegate.app › sources
www.sciencegate.app
Peter Evanschitzky ◽. Vicky Philipsen ◽. Frank Timmermans ◽ ... Keyword(s):. Euv Lithography · Download Full-text ...
Validity of the Hopkins approximation in simulations of hyper-NA...
spie.org
Author(s): Andreas Erdmann; Giuseppe Citarella; Peter Evanschitzky; Hans Schermer; Vicky Philipsen; Peter De Bisschop. Date: 15 Ma …
Characterization and mitigation of 3D mask effects in ProQuestsearch.proquest.com › openview › 1.pdf
www.proquest.com
Andreas Erdmann*, Dongbo Xua, Peter Evanschitzky, Vicky Philipsen, Vu Luong and Eric Hendrickx. Characterization and mitigation of 3D mask effects.
Application of actinic mask review system for the preparation of HVM ...www.lens.org › scholar › article › recommended
www.lens.org
Mar 19, 2018; Authors: Andreas Erdmann , Peter Evanschitzky , Hazem Mesilhy , Vicky Philipsen , Eric Hendrickx , Markus Bauer; Citing Patents:
Journal of Micro-Nanolithography MEMS and MOEMS - Peerefwww.peeref.com › journals › journal-of-micro-nano...
www.peeref.com
... materials for high NA EUV lithography: (2020) Andreas Erdmann, Hazem Mesilhy, Peter Evanschitzky, Vicky Philipsen, Frank Timmermans, Markus Bauer.
Journal of Micro/Nanolithography - Fatcatfatcat.wiki › container
fatcat.wiki
Andreas Erdmann, Hazem Mesilhy, Peter Evanschitzky, Vicky Philipsen, Frank Timmermans, Markus Bauer | Journal of Micro/Nanolithography
Novel EUV mask absorber evaluation in support of next-generation ...research.utwente.nl › publications › novel-euv-mask...
research.utwente.nl
· Vicky Philipsen*, Kim Vu Luong, Karl Opsomer, Christophe Detavernier, Eric Hendrickx, Andreas Erdmann, Peter Evanschitzky, Robbert W.E. ...
Journal of Micro/Nanolithography, MEMS, and MOEMS - Scilitwww.scilit.net › journal
www.scilit.net
Hazem Mesilhy, Peter Evanschitzky, Vicky Philipsen, Frank Timmermans, Markus Bauer. Published: 1 October by SPIE-Intl Soc Optical Eng.
Reducing EUV mask 3D effects by alternative metal absorbers –...
research.utwente.nl
Vicky Philipsen, Kim Vu Luong, Laurent Souriau, Eric Hendrickx, Andreas Erdmann, Dongbo Xu, Peter Evanschitzky, Robbert W.E. Van De Kruijs, Arash Edrisi, ...
Manufacturing Bits: Oct. 6
semiengineering.com
· Andreas Erdmann (Fraunhofer), Hazem S. Mesilhy (Fraunhofer), Peter Evanschitzky (Fraunhofer), Vicky Philipsen (Imec), Frank J. Timmermans ...
高NA EUV光刻吸收材料的观点和权衡,Journal of Micro X-MOLwww.x-mol.com › paper
www.x-mol.com
Andreas Erdmann 1 , Hazem Mesilhy 1 , Peter Evanschitzky 1 , Vicky Philipsen 2 , Frank Timmermans 3 , Markus Bauer 4. Affiliation.
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Frank Schmidt Jürgen Lorenz Markus Bauer | Andreas Erdmann Eberhard Bär Alex Burenkov | Georg Roeder Andreas Schwenk Yvonne Evanschitzky |
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