Tatjana Widerschpan und Jun Li - Info zur Person

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Mechanistic Investigation of the VUV and UV-C Photolysis of ...ACS Publications

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von K Lee · · Zitiert von: 18 — Braun,§ Tatjana Widerschpan,§. David A. Dixon,| Jun Li,. ⊥. Marius Ivan,X and Paul Zimmerman*,4. Contribution from the Department of Chemistry, Columbia ...

157 nm Pellicles (Thin Films) for Photolithography: Mechanistic ...Pacific Northwest National Laboratory | PNNL (.gov)

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Braun, Tatjana Widerschpan, David A. Dixon, Jun Li, Marius Ivan, Paul Zimmerman. Language English. Pacific Northwest National Laboratory · U.S. Department of ...

157 nm Pellicles (Thin Films) for Photolithography: Mechanistic ...Academia.edu

www.academia.edu

Braun,§ Tatjana Widerschpan,§ David A. Dixon,| Jun Li,⊥ Marius Ivan,X and Paul Zimmerman*,4 Contribution from the Department of Chemistry, Columbia ...

Ohne TitelRSC Publishing

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Braun, Tatjana Widerschpan, David A. Dixon, Jun Li, Marius Ivan and Paul Zimmerman. J. Am. Chem. Soc., 2005, 127, DOI: ja Decomposition ...

sup> radical: Decomposition vs. reaction with O2OUCI

ouci.dntb.gov.ua

Braun, Tatjana Widerschpan, David A. Dixon, Jun Li, Marius Ivan, Paul Zimmerman. https://doi.org ja · Full text , Journal of the American ...

用于光刻的157 nm 薄膜（薄膜）：碳氟化合物的VUV 和UV-C ...X-MOL

www.x-mol.com

Braun 1 , Tatjana Widerschpan 1 , David A. Dixon 1 , Jun Li 1 , Marius Ivan 1 , Paul Zimmerman 1. Affiliation. Contribution from the Department of Chemistry ...

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